منابع مشابه
Nanoimprint Technology: Recent Progress and Applications
Nanoimprint Lithography (NIL) has emerged as a promising nanopatterning technology in recent years. NIL uses a hard mold to mechanically deform the polymer resist material to create nanoscale patterns, which completely free itself from the resolution-limiting factors such as light diffraction or beam scattering that are often inherent with other more traditional approaches. Our recent work have...
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Nanoimprint is an emerging lithographic technology that promises high-throughput patterning of nanostructures. Based on the mechanical embossing principle, nanoimprint technique can achieve pattern resolutions beyond the limitations set by the light diffractions or beam scatterings in other conventional techniques. This article reviews the basic principles of nanoimprint technology and some of ...
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متن کاملNanoimprint Lithography
The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the chemical and physical properties of the resist, NIL relies on direct mechanical deformation of the...
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ژورنال
عنوان ژورنال: Journal of the Japan Society for Precision Engineering
سال: 2019
ISSN: 0912-0289,1882-675X
DOI: 10.2493/jjspe.85.699